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Final polishing with oxides Porous neoprene cloth for final polishing of all materials with oxide suspensions. Chemal resists both acidic and alkaline Silicon Oxide suspensions like Akasel Colloidal and Fumed Silicas.
Use low forces, 15N on a 30 mm sample, and plenty of suspension to avoid running dry. Mag-Cloths are used on magnetic support discs.